Key Features and Benefits

Dual Sputtering Modes

Seamlessly switch between RF and DC sputtering to optimize the deposition process for different materials and applications.

High-Precision Control

Advanced power supply units with fine-tuned control over sputtering parameters ensure uniform thin film coatings with exceptional adhesion and density.

Customizable Configuration

Tailor the system to your specific needs with customizable chamber sizes, target configurations, and substrate holders, accommodating diverse research and production requirements.

Robust Vacuum System

Integrated with a high-performance vacuum pumping system, the RF/DC Sputtering System achieves ultra-high vacuum levels, reducing contamination and ensuring high-purity thin films.

Ideal for applications in materials science, semiconductor research, and nanotechnology, our RF/DC Sputtering System delivers unparalleled performance and reliability, making it an essential tool for any advanced laboratory.